The COPRA DN 160CF are our smallest source solutions out of our DN family. They are designed to be used for Research and Development use in the field of Plasma Surface Science on small substrates of up to 3" wafer size. High plasma densities in combination with dissociation degrees of up to 90% enable accurate surface cleaning, activation and etching as also post oxidation/nitridation of PVD processes. Those sources are also enabling basic PECVD processes on small substrate sizes. The results achieved by the COPRA DN160CF sources are typically transferable on larger substrate dimensions by using the COPRA plasma sources for larger substrate sizes.
CCR GmbH
Camp-Spich-Str. 3a
D-53842 Troisdorf
T: +49(0)2241-93215-0
F: +49(0)2241-93215-200
