The COPRA DN 200-X flange mounted round RF-ICP sources are typically used for substrates sizes of up to 4"size and designed for PECVD, E-Gun Assist, Sputter-Assist, Chemical Etching, cleaning/activation, PALD, DLC. They can be powered with up to 1,2kW and represent the smallest COPRA DN source for industrial productions. In relation to their small footprint they are very attractive to be used in installations where small dimensions are needed. The variety of process applications in relation to their small footprint and make these type of sources attractive working horses. The results achieved by the COPRA DN200-X are transferable on larger substrate dimensions by using the COPRA plasma sources for larger substrate sizes.
CCR GmbH
Camp-Spich-Str. 3a
D-53842 Troisdorf
T: +49(0)2241-93215-0
F: +49(0)2241-93215-200
