The COPRA DN250-ISO-F 3kW RF-ICP flange mounted round source solutions for substrate sizes of up to 6" can be powered up to 3kW. This source type do have excellent E-Gun or Sputter-Assist, Cleaning/Activation and DLC coating capabilities. The ease of generation of atomic species of the gases you run through the COPRA DN250-ISO-F 3KW CCR is highly appreciated for state of the art PVD Assist requirements. The COPRA plasma source solutions are scalable. In many cases the process developments made with our smaller source solutions are being transferred on substrates of larger dimensions by using the COPRA plasma sources for larger substrate sizes which are completing our RF-ICP plasma source solution portfolio.
CCR GmbH
Camp-Spich-Str. 3a
D-53842 Troisdorf
T: +49(0)2241-93215-0
F: +49(0)2241-93215-200
